Kinetic study of UV cationic photocuring of bis-phenol A epoxy resin
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Kinetic study of UV cationic photocuring of bis-phenol A epoxy resin
Journal of Radiation Research and Radiation ProcessingVol. 24, Issue 4, Pages: 197-200(2006)
作者机构:
1.中国科学院理化技术研究所 北京 100101
2.北京化工大学材料科学与工程学院 北京 100029
3.中国科学院研究生院 北京 100049
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HE Yong, SUN Mengzhou, OU Xiaowei, et al. Kinetic study of UV cationic photocuring of bis-phenol A epoxy resin. [J]. Journal of Radiation Research and Radiation Processing 24(4):197-200(2006)
DOI:
HE Yong, SUN Mengzhou, OU Xiaowei, et al. Kinetic study of UV cationic photocuring of bis-phenol A epoxy resin. [J]. Journal of Radiation Research and Radiation Processing 24(4):197-200(2006)DOI:
Kinetic study of UV cationic photocuring of bis-phenol A epoxy resin
Cationic UV curing of bis-phenol A epoxy resin was studied. Effects of the component combinations on photocuring kinetics were investigated with the lowest photocuring rate method and Real-Time FTIR. The results demonstrated that epoxide dilute decreased the photocuring rate obviously and hydroxyl compound (HC) showed slight influence. But in a combination system, the HC exhibited unique dominative function on photocuring rate.
关键词
紫外光固化阳离子双酚A环氧树脂动力学
Keywords
UV photocuringCationicBis-phenol A epoxy resinKinetic