Manufacture of polyimide micron-hole separation membrane by electron beam etching
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Manufacture of polyimide micron-hole separation membrane by electron beam etching
Journal of Radiation Research and Radiation ProcessingVol. 25, Issue 6, Pages: 345-349(2007)
作者机构:
1.上海大学环化学院化工系 上海 201800
2.上海大学射线应用研究所 上海 201800
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WU Xinfeng, LI Hongbin, HAO Xufeng, et al. Manufacture of polyimide micron-hole separation membrane by electron beam etching. [J]. Journal of Radiation Research and Radiation Processing 25(6):345-349(2007)
DOI:
WU Xinfeng, LI Hongbin, HAO Xufeng, et al. Manufacture of polyimide micron-hole separation membrane by electron beam etching. [J]. Journal of Radiation Research and Radiation Processing 25(6):345-349(2007)DOI:
Manufacture of polyimide micron-hole separation membrane by electron beam etching
Polyimide (PI) film etched by electron beam (EB) to produce PI micron-hole separation membrane combined with the methods of masks and oxygenation corrosion was studied in this paper. The effect of the absorbed doses, corrosion time and corrosion temperature on the corrosion speed of irradiated PI were discussed. The results showed that the corrosion speed of irradiated PI grew up with increasing the corrosion temperature, corrosion time and absorbed dose gradually. The analysis of infrared spectroscopy (IR) indicated that the main chain of PI molecules was broken by EB to certain extent. It meant the molecule weight of PI turned small and PI film was eroded easily by oxidation solution. In the EB etching process, a piece of lead mask with micron-holes was covered on the PI film and was etched by EB. And then the irradiated PI film was eroded by the solution of H,2,SO,4, and K,2,Cr,2,O,4,. A piece of PI micron-hole separation membrane was gained by this technology.
关键词
电子束辐照聚酰亚胺腐蚀分离膜蚀刻
Keywords
Electron beam(EB)Polyimide (PI)ErodeSeparation membraneEtch