AN ELECTROPHORESIS STUDY OF DNA PHOTOSENSITIZATION DAMAGE BY TRIS (BIPYRIDINE) RUTHENIUM (III)

ZHANG Lianwen; LIN Weizhen; HAN Zhenhui; YAO Side; LIN Nianyun

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AN ELECTROPHORESIS STUDY OF DNA PHOTOSENSITIZATION DAMAGE BY TRIS (BIPYRIDINE) RUTHENIUM (III)

更新时间：2023-04-07

- AN ELECTROPHORESIS STUDY OF DNA PHOTOSENSITIZATION DAMAGE BY TRIS (BIPYRIDINE) RUTHENIUM (III)
- Journal of Radiation Research and Radiation Processing Vol. 18, Issue 3, Pages: 161-167(2000)
- 作者机构：
  
  1.中国科学院上海原子核研究所辐射化学开放实验室　上海　201800
- 作者简介：
  
  **
- 基金信息：
  
  the Research Foundation of Chinese Academy of Sciences(KJ952-S1-419)
- DOI：
  CLC：
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ZHANG Lianwen, LIN Weizhen, HAN Zhenhui, et al. AN ELECTROPHORESIS STUDY OF DNA PHOTOSENSITIZATION DAMAGE BY TRIS (BIPYRIDINE) RUTHENIUM (III). [J]. Journal of Radiation Research and Radiation Processing 18(3):161-167(2000)
DOI：

ZHANG Lianwen, LIN Weizhen, HAN Zhenhui, et al. AN ELECTROPHORESIS STUDY OF DNA PHOTOSENSITIZATION DAMAGE BY TRIS (BIPYRIDINE) RUTHENIUM (III). [J]. Journal of Radiation Research and Radiation Processing 18(3):161-167(2000) DOI：

摘要

采用琼脂糖凝胶电泳研究了以可见光引发的三联吡啶钌（III）与DNA之间的光敏反应。发现在有氧气条件下，三联吡啶钌（III）经427～457nm光照可导致DNA的光敏损伤，其途径主要是通过单线态氧与DNA反应引起的碱基损伤，另外则是通过DNA与三联吡啶钌阳离子自由基（[Ru,2+,（bpy）,2,（bpy,+•,）],3+,）反应导致碱基损伤而产生的，而且损伤与DNA和联吡啶钌之间的浓度比存在着一定关系。对照单链DNA及双链DNA光敏损伤结果后发现，单链DNA较双链DNA更易于产生光敏损伤，这可能是由于单链DNA中碱基较双链DNA中的更为暴露的缘故。

Abstract

The photosensitization effects of tris(bipyridine)ruthenium-(III) on DNA caused by visible light has been studied by using of agarose electrophoresis. In the presence of oxygen, it was found that DNA strand break, which amount was related to the concentration ratios of DNA and tris-(bipyridine)-ruthenium-(III), the DNA fragments appearing induced by tris-(bipyridine)-ruthenium-(III) irradiated with the light wavelength ranged at 427-457nm via base damage mainly resulted from the reaction of DNA with singlet oxygen, which was produced from the reaction between ground state oxygen and excite state of tris-(bipyridine)-ruthenium-(III), and via that from the reaction with cation radical of tris-(bipyridine)-ruthenium-(III). It also shown that the ssDNA did more easily break than that of dsDNA, which might be due to the more base accessible in ssDNA.

关键词

三联吡啶钌（III）光敏损伤凝胶电泳ssDNAdsDNA

Keywords

Tris-(bipyridine)-ruthenium(III)Photosensitization damageElectrophoresisssDNAdsDNA

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