您当前的位置:
首页 >
文章列表页 >
Influence of total ionizing dose effects on domestic SiGe BiCMOS under different bias conditions
RADIATION INTERDISCIPLINARY RESEARCH | 更新时间:2025-02-28
    • Influence of total ionizing dose effects on domestic SiGe BiCMOS under different bias conditions

    • According to the latest report, domestically produced 0.35 micron SiGe BiCMOS process devices exhibit excellent resistance to total ionizing dose effects under high dose rate irradiation, providing a new solution for electronic device applications in radiation environments.
    • Journal of Radiation Research and Radiation Processing   Vol. 38, Issue 5, Pages: 60-66(2020)
    • DOI:10.11889/j.1000-3436.2020.rrj.38.050701    

      CLC: O77+4
    • Received:09 March 2020

      Revised:28 April 2020

      Accepted:2020-04-28

      Published:20 October 2020

    移动端阅览

  • WANG Libin,WANG Xin,WU Xue,et al.Influence of total ionizing dose effects on domestic SiGe BiCMOS under different bias conditions[J].Journal of Radiation Research and Radiation Processing,2020,38(05):60-66. DOI: 10.11889/j.1000-3436.2020.rrj.38.050701.

  •  
  •  

0

Views

81

下载量

0

CSCD

Alert me when the article has been cited
提交
Tools
Download
Export Citation
Share
Add to favorites
Add to my album

Related Articles

No data

Related Author

No data

Related Institution

No data
0