Influence of total ionizing dose effects on domestic SiGe BiCMOS under different bias conditions
“According to the latest report, domestically produced 0.35 micron SiGe BiCMOS process devices exhibit excellent resistance to total ionizing dose effects under high dose rate irradiation, providing a new solution for electronic device applications in radiation environments.”
Journal of Radiation Research and Radiation ProcessingVol. 38, Issue 5, Pages: 60-66(2020)
WANG Libin (male) was born in June 1992, and obtained his bachelor degree from YanTai University in 2015. Now he is a graduate student at Xinjiang University, majoring in nuclear technology and applications
LU Wu, professor, doctoral supervisor, E-mail: luwu@ms.xjb.ac.cn
基金信息:
Science and Technology on Analog Integrated Circuit Laboratory(JCKY2019210C055);the Tianchi Doctoral Plan of Autonomous Region (under Grant No [2018]111), and West Light Foundation of the Chinese Academy of Sciences(新科证字[2018]111号)
WANG Libin,WANG Xin,WU Xue,et al.Influence of total ionizing dose effects on domestic SiGe BiCMOS under different bias conditions[J].Journal of Radiation Research and Radiation Processing,2020,38(05):60-66.
WANG Libin,WANG Xin,WU Xue,et al.Influence of total ionizing dose effects on domestic SiGe BiCMOS under different bias conditions[J].Journal of Radiation Research and Radiation Processing,2020,38(05):60-66. DOI: 10.11889/j.1000-3436.2020.rrj.38.050701.
Influence of total ionizing dose effects on domestic SiGe BiCMOS under different bias conditions