Research and design of high voltage radiation hardened lateral diffused metal oxide semiconductor
“In the field of aerospace grade power integrated circuits, experts have studied high-voltage LDMOS anti single particle effect reinforcement technology to provide a solution for improving the radiation resistance performance of devices.”
Journal of Radiation Research and Radiation ProcessingVol. 40, Issue 5, Pages: 82-88(2022)
作者机构:
1.南京航空航天大学 南京 211106
2.北京微电子技术研究所 北京 100076
作者简介:
CHU Fei (male) was born in 1979, engaging in digital-analog mixed IC design, radiation hardenreinforcement design, complex equipment algorithm research, satellite navigation application, and technology and quality management, graduate student, professor, E-mail: sdcf_2000@163.com
CHU Fei,CHEN Hongzhuan,PENG Ling,et al.Research and design of high voltage radiation hardened lateral diffused metal oxide semiconductor[J].Journal of Radiation Research and Radiation Processing,2022,40(05):82-88.
CHU Fei,CHEN Hongzhuan,PENG Ling,et al.Research and design of high voltage radiation hardened lateral diffused metal oxide semiconductor[J].Journal of Radiation Research and Radiation Processing,2022,40(05):82-88. DOI: 10.11889/j.1000-3436.2022-0035.
Research and design of high voltage radiation hardened lateral diffused metal oxide semiconductor