SUN Fang, ZHANG Nan, JIANG Shengling, et al. Study on properties of UV-curable films based on alkali-soluble photosensitive polysiloxane urethane acrylate oligomer[J]. Journal of Radiation Research and Radiation Processing, 2011,29(3):149-153.
SUN Fang, ZHANG Nan, JIANG Shengling, et al. Study on properties of UV-curable films based on alkali-soluble photosensitive polysiloxane urethane acrylate oligomer[J]. Journal of Radiation Research and Radiation Processing, 2011,29(3):149-153.DOI:
A UV- curable alkali-soluble polysiloxane urethane acrylate (APSUA) for solder mask was designed and synthesized in this work. The effect of composition of APSUA on physical and mechanical properties of UV curing APSUA materials including water resistance, volume shrinkage, hardness, tensile strength, elongation and heat resistance, was investigated in this paper. The results showed that reactive monomers with hydroxyl bonding could increase water absorption of the APSUA. The water absorption of the APSUA decreased with increasing crosslinking yields. The volume shrinkage of the APSUA decreased with increasing APSUA concentrations in the system and the volume shrinkage of investigated APSUA was lower than 6%. Multi-functional monomer and acrylate monomer with rigid structure could improve hardness of APSUA. When functionality of reactive monomer increased the heat resistance of APSUA could be enhanced. The APSUA possesses excellent compatibility with most of acrylate monomers.