Influence of UV illumination on track etching process

LIU Qi; ZHU Zhiyong; Maekawa Yasunari; Yoshida Masaru; YAO Side

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Influence of UV illumination on track etching process

Radiation Modification of Polymeric Materials | 更新时间：2023-03-30

- Influence of UV illumination on track etching process
- Influence of UV illumination on track etching process
- Journal of Radiation Research and Radiation Processing 2005年23卷第2期页码：108
- 作者机构：
  
  1.Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800
  2.Takasaki Radiation Chemistry Research Establishment, JAERI, 1233 Watanuki-machi, Takasaki, Gunma 370-1292, Japan
- 作者简介：
  
  刘崎，男，1973年5月出生，中国科学院上海应用物理研究所在读博士生，从事离子径迹蚀刻和智能高分子材料的研制工作
  朱智勇
- 基金信息：
  
  中国科学院《西部之光》和上海应用物理研究所《引进人才项目》(90120432)
- DOI：
  中图分类号：
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Influence of UV illumination on track etching process[J]. Journal of Radiation Research and Radiation Processing, 2005,23(2):108.

LIU Qi, ZHU Zhiyong, Maekawa Yasunari, et al. Influence of UV illumination on track etching process[J]. 辐射研究与辐射工艺学报, 2005,23(2):108.
Influence of UV illumination on track etching process[J]. Journal of Radiation Research and Radiation Processing, 2005,23(2):108. DOI：

LIU Qi, ZHU Zhiyong, Maekawa Yasunari, et al. Influence of UV illumination on track etching process[J]. 辐射研究与辐射工艺学报, 2005,23(2):108. DOI：

摘要

Abstract

Track technology depends decisively on the track structure of the material after irradiation. In order to reveal microstructures of the ion-tracks, many techniques have been applied to characterize the track. Conductometric method is wildly used in the area as it can monitor ,in-situ, the pore formation and growth processes that are closely related to structures of the ion track,[1],.

关键词

Keywords

Ion trackUV illuminationChemical etching

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