A new method has been established to graft vinyl monomers onto silk fabrics by ultraviolet rays without any initiator or photosensitizer, in an attempt to improve undesirable properties of the materials with increased wrinkle recovery, better dyeing ability and color-fastness, and higher resistance to photo-yellowing, etc. In this work, effectiveness of different types of UV devices and experimental conditions of the photo-induced graft-copolymerization were investigated to control the influential factors on the grafting yield and properties of the graft-copolymer. Surface characteristics and structure changes, thermal properties and wrinkle resistance of grafted silk fabrics were studied. The grafted silk fabrics showed improved properties in crease resistance, dyeing ability and color-fastness, and heat stability as well. In detail, graft-copolymerization of 2-(Dimethylamino)ethyl methacrylate onto silk fabrics can make silk fabrics undergo from slight to drastic changes in their dyeing behavior, i.e., rate of dyeing and uptake of acid dyes. Different reaction systems of the same monomer can lead to reverse dyeing properties, indicating not only the function but also the structure affects the properties of grafted silk fabrics, especially the color-fastness. The UV light graft copolymerization method is of significance in silk industrial applications in terms of the facility cost, operation convenience and grafting efficiency, in comparison to ,60,Co γ-ray and electron beam irradiation facilities.