
1.中国科学院近代物理研究所,兰州 730000
2.中国科学院金属研究所,沈阳 110015
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刘昌龙, 侯明东, 全明秀, 等. Ar离子辐照的非晶态合金表面发泡扫描电镜观测[J]. 辐射研究与辐射工艺学报, 1995,13(4):199-203.
Liu Changlong, Hou Mingdong, Quan Mingxiu, et al. SEM INVESTIGATION OF SURFACE BLISTERING FOR ARGON ION BOMBARDED AMORPHOUS ALLOYS[J]. Journal of Radiation Research and Radiation Processing, 1995,13(4):199-203.
150、195和300 keV Ar离子在室温下辐照非晶态合金Co,70,.,2,Fe,3,.,9,Nb,3,.,9,Si,14,B,8,和Co,66,Fe,4,.,5, V,2,.,25,Ni,2,.,25,Si,10,B,15,,扫描电镜在一定的辐照剂量范围观测到了表面发泡形成,发泡形成的临界剂量和直径随离子能量增加而增加。Ar离子能量高于195keV时,发泡和发泡破裂是主要的表面损伤现象,而在150keV Ar离子辐照下,未观测到发泡破裂。使用Ar离子的聚集、临界气压的建立和气体从近表面的释放解释了表面发泡效应。
Surface blistering of the amorphous alloys Co,70,.,2,Fe,3,.,9,Nb,3,.,9,Si,14,B,8, and Co,66,Fe,4.5,V,2.25,Ni,2.25,Si,10,B,15, due to argon ion bombardment at energies of 150, 195 and 300 keV has been observed with a scanning electron microscope (SEM). The critical dose for onset of blistering and the blister diameter are determined and found to increase with increasing projectile energy. Above about 195 keV, blisters and rupture of blisters are the predominant surface damage phenomena. However, at 150 keV, there is no evidence of cracked blisters. The effects are interpreted in terms of argon agglomeration, building-up of the critical argon pressure, and argon releasing from near-surface regions.
Ar离子辐照非晶态合金发泡
Argon ion irradiationAmorphous alloyBlistering
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