甲基丙烯酸酯类含硅有机单体的制备及其光固化

郭秀平; 李杰; 余柳俭; 王勇; 王涛

doi:10.11889/j.1000-3436.2017.rrj.35.030302

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甲基丙烯酸酯类含硅有机单体的制备及其光固化

辐射化学 | 更新时间：2021-12-10

- 甲基丙烯酸酯类含硅有机单体的制备及其光固化
- Preparation and UV curing of silicon-containing methyl methacrylate monomer
- 辐射研究与辐射工艺学报 2017年35卷第3期
- 作者机构：
  
  1.北京化工大学理学院北京 100029
- 作者简介：
  
  [ "郭秀平, 女, 1991年3月出生, 2014年毕业于河北师范大学汇华学院, 目前为北京化工大学理学院在读硕士, E-mail:guoxiupingyouxiang@163.com", "GUO Xiuping (female) was born in March 1991, and graduated from Huihua College of Hebei Normal University in 2014. Now she is a master candidate in College of Chemistry, Beijing University of Chemical Technology, E-mail:guoxiupingyouxiang@163.com" ]
  王涛, 博士, 教授, E-mail:wangtwj@163.com Ph.D. WANG Tao, Professor, E-mail:wangtwj@163.com
- 基金信息：
- DOI：10.11889/j.1000-3436.2017.rrj.35.030302
  中图分类号：
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郭秀平, 李杰, 余柳俭, 等. 甲基丙烯酸酯类含硅有机单体的制备及其光固化[J]. 辐射研究与辐射工艺学报, 2017,35(3):030302-6.

Xiuping GUO, Jie LI, Liujian YU, et al. Preparation and UV curing of silicon-containing methyl methacrylate monomer[J]. Journal of Radiation Research and Radiation Processing, 2017,35(3):030302-6.
郭秀平, 李杰, 余柳俭, 等. 甲基丙烯酸酯类含硅有机单体的制备及其光固化[J]. 辐射研究与辐射工艺学报, 2017,35(3):030302-6. DOI： 10.11889/j.1000-3436.2017.rrj.35.030302.

Xiuping GUO, Jie LI, Liujian YU, et al. Preparation and UV curing of silicon-containing methyl methacrylate monomer[J]. Journal of Radiation Research and Radiation Processing, 2017,35(3):030302-6. DOI： 10.11889/j.1000-3436.2017.rrj.35.030302.

摘要

以甲基丙烯酸羟乙酯、γ-甲基丙烯酰氧基丙基三甲氧基硅烷为原料，在乙醇钠催化下进行酯化反应，合成了可以进行紫外光固化的多官能度甲基丙烯酸酯类含硅有机单体混合物（MAE-Si-OCH,3,），并通过傅里叶红外光谱和核磁共振氢谱（,1,H-NMR）对其结构进行了表征。通过,1,H-NMR确定了甲基丙烯酸酯基团，含硅基团和甲氧基的比例关系。以2，4，6-三甲基苯甲酰基-二苯基氧化膦为光引发剂，考察了MAE-Si-OCH,3,在405 nm LED光源下的自由基光固化行为。测试了MAE-Si-OCH,3,的耐酸耐碱性和硬度。研究发现，所制备的甲基丙烯酸酯类含硅有机单体可以有效地进行自由基光固化，并且具有较好的耐酸碱性和一定的硬度。

Abstract

A poly-functional silicon-containing acrylate monomer, MAE-Si-OCH,3, was synthesized via transesterification reaction using γ-(meth-acryloxypropyl) trimethoxy silane and hydroxyethyl methylacrylate as raw materials and sodium ethoxide as the catalyst. The structure of MAE-Si-OCH,3, was characterized by Fourier transform infrared (FTIR) spectroscopy and ,1,H-NMR. The ratio of double bond and methoxy groups in the monomer was determined by ,1,H-NMR. The photopolymerization reaction of MAE-Si-OCH,3, was also studied, and its resistance to acids, alkalis, and hardness were tested. The results show that MAE-Si-OCH,3, displays excellent photopolymerization efficiency, has a good resistance towards acids and alkalis and is quite hard.

关键词

多官能度单体光固化自由基

Keywords

Poly-functional monomerUV-curableFree radical

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