Synthesis and properties of photosensitive polysiloxane release agent

SUN Fang; ZHU Guoqiang; DU Hongguang

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Synthesis and properties of photosensitive polysiloxane release agent

更新时间：2023-03-30

- Synthesis and properties of photosensitive polysiloxane release agent
- Journal of Radiation Research and Radiation Processing Vol. 25, Issue 1, Pages: 43-46(2007)
- 作者机构：
  
  1.北京化工大学理学院　北京　100029
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SUN Fang, ZHU Guoqiang, DU Hongguang. Synthesis and properties of photosensitive polysiloxane release agent. [J]. Journal of Radiation Research and Radiation Processing 25(1):43-46(2007)
DOI：

SUN Fang, ZHU Guoqiang, DU Hongguang. Synthesis and properties of photosensitive polysiloxane release agent. [J]. Journal of Radiation Research and Radiation Processing 25(1):43-46(2007) DOI：

摘要

以含氢硅油和甲基丙烯酸烯丙酯为原料，通过硅氢加成法制备了具有紫外光固化性能的聚二甲基硅氧烷丙烯酸酯防粘剂预聚体。研究了反应温度、催化剂浓度及溶剂对反应的影响，确定了最佳反应条件：反应温度为60－70℃，以三苯基膦氯化铑为催化剂，加入量为原料总重量的0.04%。利用红外光谱法表征了预聚物的结构，并考察了其感光性能及表面性能。预聚体的感度可达56.9mJ/cm,2,，其固化膜具有较低的表面能（,γ,d,S,（H,2,O）＝32.49 mN/m）。

Abstract

Polysiloxane acrylate oligomer (PSAE), which possesses UV-curing capability and release property, was synthesized by hydrosilyation reaction of polyhydrosiloxane with allyl methylacrylate. The effects of reaction temperature, catalyst concentration and solvent on the reaction were studied. It was found that the optimum synthesis temperature for PSAE was 60—70℃. Tris (Triphenylphosphine) rhodium chloride was used as catalyst with 0.04% of total amount of reactants. Structure of the oligomer was characterized by FTIR. Photosensitive and surface properties of as-synthesized PSAE were investigated. The photosensitivity of PSAE is 56.9mJ/cm,2,. UV–cured film of PSAE possesses lower surface energy with ,γ,d,S, (H,2,O) of 32.49mN/m.

关键词

防粘剂硅氢加成丙烯酸酯光固化

Keywords

Release agentHydrosilyation reactionAcrylateUV–curing

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Department of Chemistry, Beijing Normal University

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