STUDY ON THE STRUCTURE AND PROPERTY FOR ALKALI DEVELOPABLE PHOTOSENSITIVE RESINS
|更新时间:2023-04-07
|
STUDY ON THE STRUCTURE AND PROPERTY FOR ALKALI DEVELOPABLE PHOTOSENSITIVE RESINS
Journal of Radiation Research and Radiation ProcessingVol. 17, Issue 4, Pages: 219-224(1999)
作者机构:
1.北京化工大学材料科学与工程学院 北京 100029
作者简介:
基金信息:
DOI:
CLC:
扫 描 看 全 文
SONG Guangjie, WU Hui, JIN Yangzhi. STUDY ON THE STRUCTURE AND PROPERTY FOR ALKALI DEVELOPABLE PHOTOSENSITIVE RESINS. [J]. Journal of Radiation Research and Radiation Processing 17(4):219-224(1999)
DOI:
SONG Guangjie, WU Hui, JIN Yangzhi. STUDY ON THE STRUCTURE AND PROPERTY FOR ALKALI DEVELOPABLE PHOTOSENSITIVE RESINS. [J]. Journal of Radiation Research and Radiation Processing 17(4):219-224(1999)DOI:
STUDY ON THE STRUCTURE AND PROPERTY FOR ALKALI DEVELOPABLE PHOTOSENSITIVE RESINS
Five different forms,four ratioes and three kinds of alkali developable photosensitive resins were systhesized. Especially this paper studied their alkali developable as well as the light curing speed. Along with adding the ratio between photosensitive resin and maleic anhydride,alkali developable was better and the light curing speed was faster. When the ratio was more than 1:0.7,the resin had better alkali developable. Photoimage etching ink made up by alkali developable novolak epoxy acrylic resin had better alkali developable.
关键词
环氧丙烯酸树脂碱溶性光成像抗蚀剂UV固化材料
Keywords
Epoxy acrylic resinAlkali developablePhotoimageEtchingUV curing material