PLASMA POLYMERIZATION OF HEXAMETHYLCYCLOTRISILOXANE IN NITROGEN-CONTATING GASES
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PLASMA POLYMERIZATION OF HEXAMETHYLCYCLOTRISILOXANE IN NITROGEN-CONTATING GASES
Journal of Radiation Research and Radiation ProcessingVol. 7, Issue 3, Pages: 10-14(1989)
作者机构:
1.中国科学院长春应用化学研究所,长春
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Yu Zili, Ye Mu, Lu Lizhen, et al. PLASMA POLYMERIZATION OF HEXAMETHYLCYCLOTRISILOXANE IN NITROGEN-CONTATING GASES. [J]. Journal of Radiation Research and Radiation Processing 7(3):10-14(1989)
DOI:
Yu Zili, Ye Mu, Lu Lizhen, et al. PLASMA POLYMERIZATION OF HEXAMETHYLCYCLOTRISILOXANE IN NITROGEN-CONTATING GASES. [J]. Journal of Radiation Research and Radiation Processing 7(3):10-14(1989)DOI:
PLASMA POLYMERIZATION OF HEXAMETHYLCYCLOTRISILOXANE IN NITROGEN-CONTATING GASES
In a capacitively coupled discharge with external electrodes, hexamethylcyclotrisiloxane (D,3,) was polymerized in the presence of ammonia or nitrogen. The polymer structure was investigated by IR spectroscopy and XPS, and properties of the polymer were studied by TG analysis and contact angle detection. The results show that both N,2, and NH,3, participated into reaction and eventually incorporated into polymer structure mainly in the form of C=NH, and the N/Si ratio increased with increasing NH,3, concentration in the D,3,/NH,3, mixture. The polymeric films prepared in NH,3, are possessed of good hydrophobicity.
关键词
六甲基环三硅氧烷的等离子体聚合聚六甲基环三硅氧烷的接触角聚六甲基环三硅氧烷的表面能
Keywords
Plasma polymerization of hexamethylcyclotrisiloxaneContact angle of plasma polymerized hexamethylcyclotrisiloxaneSurface energy of plasma polymerized hexamethylcyclotrisiloxane